High Pressure High Purify Gas Filter for the Semiconductor Industry HF series by HENGKO

Description

The high-pressure gas filter is specially designed for use in high-pressure, high-purity gas delivery systems and ultra-high-purity

gas cabinets in semiconductor manufacturing processes. Crafted from durable 316L stainless steel, it offers a robust structure

with a design pressure of up to 50 MPa, while maintaining a relatively lightweight profile.

Key features include:

*High Strength and Durability:

With excellent resistance to high pressure and temperature.

*Corrosion Resistance:

Ideal for handling corrosive gases in demanding environments.

*Exceptional Filtration Efficiency:

Effectively removes dust, rust, oil mist, and hydrocarbons from compressed

air, ensuring gas purity and protecting systems from contamination.

*High Permeability and Long Service Life:

Ensures efficient gas flow and extended operational longevity.

*Easy Maintenance:

Replaceable filter elements make upkeep simple and cost-effective.

This filter enhances gas quality and ensures the efficient operation of semiconductor equipment,

making it a reliable solution for high-purity gas systems.

 

 

Product Feature

Product Features

All 316L Stainless Steel Construction

Lightweight and Compact Design: Saves installation space.

Threaded Connections: Ensures complete sealing of the high-pressure gas filter.

Compatible with C-Type and W-Type Sealing Standards

High Temperature, Pressure, and Corrosion Resistance

High Filtration Efficiency: Resistant to clogging.

Easy and Efficient Installation and Maintenance

100% Integrity Tested and Approved

100% Helium Leak Detection Tested and Approved

 

 

Datasheet

Technical Parameters

Parameter Specification
Filter Element Material 316L Stainless Steel Powder Sintered
Housing Material 316L Stainless Steel
Surface Finish - Exterior: Ra <1.6 μm
  - Interior: Electropolished, Ra ≤0.13 μm
Filtration Efficiency ≥0.003 μm
Maximum Operating Pressure 500 bar
Maximum Differential Pressure 5 bar
Maximum Operating Temperature 600°C
Downstream Cleanliness ≤0.03 particles/liter @ >0.01 μm rated flow
Helium Leak Validation 1 × 10⁻¹¹ cc/min
Helium Leak Testing 1 × 10⁻⁹ cc/min

 

Size

Here’s the part number you can order and size details :

 

Product Information Table for Disc filter type

Product Model Inlet Specification Outlet Specification Total Length (A) Filter Element OD (φB) Housing OD (φC)
Z01B-00639 1/4’’ VCR ISO NW40 Vacuum Flange 42mm (1.64’’) Φ39mm (1.53’’) Φ55mm (2.16’’)
Z01B-00695 1/4’’ VCR ISO NW50 Vacuum Flange 42mm (1.64’’) Φ52mm (2.05’’) Φ75mm (2.95’’)

 

Product Information Table for Cartridge filter type

Product Model A B C (mm) D (mm) Height H (mm) Filtration Precision Cleaning Grade
Z01G-00001 NPT1/8 NPT1/4 37 31.5 96 ≤0.003 μm C
Z01G-00002 NPT3/8 NPT3/8 56 45 198 ≤0.003 μm C
Z01G-00003 G1/2 M10*1.5 100 88 346 ≤0.003 μm C
Z01G-00004 NPT3/8 / 45 42 149 ≤0.003 μm C
Z01G-00005 G1-1/2 G1/2 125 113 440 ≤0.003 μm C
Z01G-00006 G1 G1/4 92 75 280 ≤0.003 μm C
Z01G-00007 G1 G1/4 92 75 220 ≤0.003 μm C

 

Typical Applications

Ideal for use in:

*Vacuum chambers requiring rapid and precise gas venting.
*High-sensitivity semiconductor manufacturing environments.
*Processes where turbulence minimization and particle control are critical.

With its advanced design and outstanding performance, the Diffuser Filter is the perfect choice for

optimizing filtration and flow control in semiconductor applications.

Contact us today to learn how this innovative product can elevate your production

 

*Filters high-pressure gases for cooling and process applications, especially in high-temperature settings.

*Enhances efficiency and reduces equipment wear by preventing contamination in gas cooling and flow systems.

These filters are essential in any application requiring clean, consistent gas flow, enhancing equipment protection,

process efficiency, and final product quality across industries.

 

 

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